Группа
Сканирующей зондовой микроскопии
лаборатории Оптики поверхности
Физико-Технического института им.А.Ф.Иоффе РАН.

Состав группы
Основные направления работ
Источники финансирования
Основной рабочий инструмент
Список публикации
Контактное лицо
Адрес
Состав
группы: Титков
Александр Николаевич - руководитель группы, г.н.с., дфмн.
Alexander.Titkov@pop.ioffe.rssi.ru Анкудинов
Александр Витальевич - нс,
кфмн. Гришин
Федор Александрович - стажер-исследователь, Дунаевский
Михаил Сергеевич - аспирант, Иванцов
Леонид Николаевич - радио-инженер, Крыжановский
Александр Константинович - мнс, Макаренко
Игорь Васильевич - снс,
кфмн, Снегов
Федор Михайлович - мнс, Zafar
Waqar - стажер
из университета г.Исламабад (Пакистан)
Основные
направления работ: Атомно-силовая
микроскопия и сканирующая туннельная микроскопия и спектроскопия
твердотельных наноструктур.
Источники
финансирования
Работы
ведутся при поддержке РФФИ, Министерства Науки России, а
также в сотрудничестве с зарубежными учеными.
Основной
рабочий инструмент: Комнатный
атомно-силовой микроскоп P4-SPM-MDT, Комнатный и выкуумный
сканирующие туннельные микроскопы своей разработки.
Список
публикаций:
- M.Mynbaeva, A.Titkov, A.Kryganovskii, V.Ratnikov, K.Mynbaev
et al., Structural characterization and strain relaxation
in porous GaN layers//
Applied Physics Letters 76(8), (2000) Surface
and subsurface structures of porous GaN prepared by anodizing
epitaxial GaN layers grown on SiC substrates are investigated
by atomic force microscopy. Comparison of the images of
the porous GaN surfaces with those taken on planes cleft
perpendicular to the surface shows that the pores are
formed along the boundaries of columnar structures of
the original GaN films. X-ray investigations show that
the porous GaN has less residual stresses than the initial
GaN epitaxial layers. Use of porous GaN as a buffer layer
for growth of low-stress GaN is proposed.
- A.V.Ankudinov, A.N.Titkov, T.V.Shubina, S.V.Ivanov, P.S.Kop'ev
et al., Cross-sectional atomic force microscopy of ZnMgSSe-
and BeMgZnSe-based laser diodes//
Applied Physics Letters 75(17), 2626-28 (1999). Atomic
force microscopy of cleaved facets of ZnSe-based lasers
with various active region designs is reported. Different
AFM probe friction on the materials forming the laser
structures are exploited for imaging their basic layers.
Unlike ZnMgSSe-based lasers, the cleaved surface of cladding
layers in BeMgZnSe-based structures is atomically flat,
which is attributed to hardening of the II-VI materials
by Be incorporation. Nanomiter-high steps and undulations
are observed at the laser heterointerfaces on cleaved
facets. The shape and height of such topographic singularities
located in the vicinity of a (Zn,Cd)Se quantum well active
region depend on the strain distribution in the laser
waveguide.
-
L.N.Bolotov, A.Nakamura, V.P.Evtikchiev, V.E.Tokranov,
A.N.Titkov UHV STM studies of the decapped InAs quantum
dots on GaAs(001) surface after desorption of a protective
As layer//
Surface and Interface Analysis 27, 533-536 (1999). The
morphology and electronic properties of InAs QDs on the
GaAs(001) surface has been studied by UHV STM/S after
removal of a preliminary deposited protective As layer.
A thermal annealing procedure has been developed, which,
applied to a sample with an As cap layer, allows InAs
QDs to be opened on the surface of InAs wetting layer
(WL) exhibiting a [2x4] reconstruction of As dimers. Scanning
tunneling spectroscopy measurements on the decapped surface
show that I-V characteristics taken with the tip positioned
over single InAs QDs have a smaller voltage width for
zero conductivity (dI/dV=o) when compared with those taken
over the InAs WL, which are essentially the same as the
I-V characteristics for a clean GaAs surface. This observation
seems to indicate a weakening of the surface band bending
in the area beneath InAs QDs.
-
I.Grechov, L.Delimova, I.Liniichuk, I.Veselovskii, A.Titkov,
M.Dunaevskii et al., Growth mode study of ultrathin HTSC
YBCO films on YBaCuNbO buffer//
Physica C 324, 39-46 (1999) It
is known that the critical temperature Tc of ultrathin
YBCO films is reduced to values far less than 77K. To
improve the superconducting properties of ultrathin YBCO
films, we developed a new buffer layer which allowed an
increase in the critical temperature of five-unit-cell-thick
YBCO films to values above 77K. Using atomic-force microscopy
to study the growth modes of ultrathin YBCO films deposited
on a SrTiO3 substrate and on a YBaCuNbO buffer layer,
we found that ultrathin YBCO films deposited on a SrTiO3
substrate are formed due to 2D nucleation. The growth
of ultrathin YBCO films deposited on YBaCuNbO buffer is
governed by the step-flow mode. As a consequence of the
different growth modes, the ultrathin films deposited
on a SrTiO3 substrate and a YBaCuNbO buffer layer have
different surface morphologies and superconductive properties.
We believe that the step-flow mode makes it possible to
improve the ultrathin YBCO folms structure and increase
the critical temperature.
-
V.P.Evtikhiev, V.E.Tokranov, A.K.Kryganovskii, A.M.Boiko,
R.A.Suris, A.N.Titkov Characterization of the InAs quantumdots
MBE grown on the vicinal GaAs (001) surfaces misoriented
to the [010] direction//
Journal of Crystal Growth 201/202, 1154-57 (1999) Atomic
force microscopy is used to study InAs quantum dot arrays
grown by MBE on vicinal GaAs (001) surfaces misoriented
to the [010] direction by 1, 2, 4 and 6 degrees. For a
chosen misorientation direction , it is shown that the
vicinal GaAs (001) surface is covered with a net of steppe
terraces. The condensation of the network of terraces
upon increasing of the misorientation angle leads to the
suppression of adatom surface diffusion and makes it possible
to achieve higher densities and better unifomity of quantum
dots arrays.
-
А.В.Анкудинов, В.П.Евтихиев, В.Е.Токранов, В.П.Улин, А.Н.Титков
Нанорельеф окисленной поверхности скола решетки чередующихся
гетерослоев GaAlAs/GaAs//
Физика и техника полупроводников 33(5), 594-598 (1999) Методом
атомно-силовой микроскопии исследована морфология окисленной
поверхности скола решетки чередующихся слоев GaAlAs и
GaAs. Обнаружено, что поверхность пленки естественного
окисла на сколе обладает квазистационарным нанорельефом,
отражающим состав слоев гетероструктуры. Области скола
над слоями GaAlAs оказываютс выше областей над слоями
GaAs на 0.5 нм. Стравливание пленки окисла показывает,
что на открывшейся поверхности скола также формируется
нанорельеф, однако инвертированный по отношению к рельефу
поверхности окисла. Возникновение нанорельефов на поверхности
и на нижней границе пленки естественного окисла обьяснено
различной глубиной окисления слоев GaAs и GaAlAs и увеличением
обьема при окислении.
- N.M.Shmidt, V.V.Emtsev, A.K.Kryganovskii, R.N.Kyutt,
W.V.Lundin, A.N.Titkov et al., Mosaic structure and Si
doping related peculiarities of charge carrier transport
in III-V nitrides//
Phys. Stat. Sol. (b) 216, 581-586 (1999). Studies
of the charge carrier transport in undoped moderatevily
and heavily Si doped GaN and AlGaN epilayers with different
mosaic structure are presented. The epilayer were grown
by low-pressure MOCVD on (0001) sapphire substrates. The
mosaic (columnar) structure of the epilayer has been characterized
by X-ray diffraction and AFM surface topography studies.
Application of electrostatic force microscopy (EFM) permitted
to reveal irregular potential barriers at the mosaic domain
boundaries in undoped layers and their reduction in Si
doped layers. For undoped GaN and AlGaN epilayers unconventional
transport of electrons and a low RT mobility have been
found. We relate the peculiarities in the electron transport
in undoped samples with additional carrier scatterring
on the potential barriers at domain boundaries. Si doping
reduces the potential barriers. Moderate Si doping causes
a considerable increase of the electron RT mobility and
restores normal mobility dependence on the temperature.
Контактное лицо:
Титков
Александр Николаевич
Адрес: Ст-Петербург,
194021,
ул. Политехническая 26, ФТИ им. А.Ф.Иоффе
Телефон:
(812) - 247-93-17
Факс:
(812) 247-10-17
E-mail: Alexander.Titkov@pop.ioffe.rssi.ru
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